The dynamic resistance of a diode is given by; \(R=\dfrac{26}{i(\text{mA})}~\Omega,\) where \(i\) is the diode current.
Statement I: If the current through the diode increases, then the dynamic resistance decreases.
Statement II: If the temperature of the diode is increased, with the potential difference fixed, the dynamic resistance decreases.
 
1. Statement I is incorrect and Statement II is correct.
2. Both Statement I and Statement II are correct.
3. Both Statement I and Statement II are incorrect.
4. Statement I is correct and Statement II is incorrect.

Subtopic:  PN junction |
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Level 2: 60%+
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Potential barrier across a \(\mathrm{p\text-n}\) junction is \(0.6\) V. Electric field intensity, in the depletion region having a width of \(6\times10^{-6}\) m, will be:
1. \(1\times10^{5}\) N/C
2. \(2\times10^{5}\) N/C
3. \(3\times10^{5}\) N/C
4. \(4\times10^{5}\) N/C
Subtopic:  PN junction |
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Level 1: 80%+
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An intrinsic Germanium \(\mathrm{(Ge)}\) semiconductor having \(2.5 \times 10^{29}\) atoms per \(\text m^3\) is doped uniformly by trivalent aluminium at \(1~\text{ppm}.\)If the thermally generated electron concentration at room temperature is \(n_i=10^{17}/\text m^3,\) the resulting electron concentration after doping at the same temperature will be:
1. \(2.5 \times 10^{29}~\text m^{-3}\)
2. \(4 \times 10^{10}~\text m^{-3}\)
3. \(2.5 \times 10^{18}~\text m^{-3}\)
4. \(4 \times 10^{20}~\text m^{-3}\) 
Subtopic:  Types of Semiconductors |
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Level 2: 60%+
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A \(\mathrm{Ge}\) specimen is doped with \(\mathrm{Al}.\) The concentration of acceptor atoms is approximately \(10^{24}~\text{m}^{-3}.\) Given that intrinsic carrier concentration is nearly \(10^{19}~\text{m}^{-3},\) then the concentration of electrons in the specimen is nearly:
1. \(10^{10}~\text{m}^{-3}\)
2. \(10^{14}~\text{m}^{-3}\)
3. \(10^{19}~\text{m}^{-3}\)
4. \(10^{18}~\text{m}^{-3}\)
Subtopic:  Types of Semiconductors |
 84%
Level 1: 80%+
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The depletion width of a \(\mathrm{p\text-n}\) junction depends on which of the following parameters given below?
(a) temperature
(b) type of semiconductor material
(c) doping concentration
(d) biasing of junction

Choose the correct option from the given ones:
1. (a), (b), (c)
2. (b), (c), (d)
3. (a), (c), (d)
4. (a), (b), (c), (d)
Subtopic:  PN junction |
 78%
Level 2: 60%+
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Match the items in List-I with their corresponding descriptions in List-II:
List-I List-II
(a) Intrinsic semiconductor (e) Prepared by adding phosphorus
(b) \(\mathrm{n}\text-\)type semiconductor (f) The width is nearly one micron
(c) \(\mathrm{p}\text-\)type semiconductor (g) Silicon
(d) Depletion layer (h) Prepared by adding indium

Codes:
1. (a)-(g), (b)-(e), (c)-(h), (d)-(f)
2. (a)-(h), (b)-(f), (c)-(e), (d)-(g)
3. (a)-(e), (b)-(g), (c)-(f), (d)-(h)
4. (a)-(f), (b)-(h), (c)-(g), (d)-(e)
Subtopic:  Types of Semiconductors |
 92%
Level 1: 80%+
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The energy band gap of semiconducting material to produce violet (wavelength \(=4000~\mathring{A}\)) LED is (nearly):
1. \(3~\text{eV}\)
2. \(5~\text{eV}\)
3. \(1~\text{eV}\)
4. \(7~\text{eV}\)
Subtopic:  Energy Band theory |
 88%
Level 1: 80%+
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The charge on a \(\mathrm{p}\)-type semiconductor is:
 
1. neutral 
2. negative
3. positive
4. may be positive or negative
Subtopic:  Types of Semiconductors |
 75%
Level 2: 60%+
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What is responsible for the formation of the depletion layer across the \(\mathrm{p\text-n}\) junction?

1. Drift of holes.
2. Drift of electrons.
3. Diffusion of holes and electrons.
4. Absence of diffusion of holes and electrons.
Subtopic:  PN junction |
 83%
Level 1: 80%+
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A full wave rectifier circuit along with the input and output voltages is shown in the figure. The contribution to the output voltage from diode-\(2\) is:
1. \(A,C\) 2. \(B,D\)
3. \(B,C\) 4. \(A,D\)
 
Subtopic:  Rectifier |
 82%
Level 1: 80%+
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