| Statement I: | If the current through the diode increases, then the dynamic resistance decreases. |
| Statement II: | If the temperature of the diode is increased, with the potential difference fixed, the dynamic resistance decreases. |
| 1. | Statement I is incorrect and Statement II is correct. |
| 2. | Both Statement I and Statement II are correct. |
| 3. | Both Statement I and Statement II are incorrect. |
| 4. | Statement I is correct and Statement II is incorrect. |
| (a) | temperature |
| (b) | type of semiconductor material |
| (c) | doping concentration |
| (d) | biasing of junction |
| 1. | (a), (b), (c) |
| 2. | (b), (c), (d) |
| 3. | (a), (c), (d) |
| 4. | (a), (b), (c), (d) |
| List-I | List-II | ||
| (a) | Intrinsic semiconductor | (e) | Prepared by adding phosphorus |
| (b) | \(\mathrm{n}\text-\)type semiconductor | (f) | The width is nearly one micron |
| (c) | \(\mathrm{p}\text-\)type semiconductor | (g) | Silicon |
| (d) | Depletion layer | (h) | Prepared by adding indium |
| 1. | (a)-(g), (b)-(e), (c)-(h), (d)-(f) |
| 2. | (a)-(h), (b)-(f), (c)-(e), (d)-(g) |
| 3. | (a)-(e), (b)-(g), (c)-(f), (d)-(h) |
| 4. | (a)-(f), (b)-(h), (c)-(g), (d)-(e) |
| 1. | neutral |
| 2. | negative |
| 3. | positive |
| 4. | may be positive or negative |
What is responsible for the formation of the depletion layer across the \(\mathrm{p\text-n}\) junction?
| 1. | Drift of holes. |
| 2. | Drift of electrons. |
| 3. | Diffusion of holes and electrons. |
| 4. | Absence of diffusion of holes and electrons. |
| 1. | \(A,C\) | 2. | \(B,D\) |
| 3. | \(B,C\) | 4. | \(A,D\) |